Cleaned photomasks are essential to improve product yields.
Technovision’s expertise in cleaning and drying techniques helps you maintain high standards of cleanness for any procedure involving photomasks.
The Photomask Cleaning System is available in four models that can be used with a wide range of small to large photomasks.
| Mask Size | Cleans devices up to 300mm × 300mm |
|---|---|
| Dimensions | 980mm(W) × 720mm(D) × 1,760mm(H) |
| Weight | 250Kg |
■Main features
| Features | |
|---|---|
| 1 | Precise and scratch-free cleaning with special brushes. |
| 2 | Ideal design for double-sided cleaning. |
| 3 | Compact footprint. |
| 4 | Best suited to low-volume production of various devices and R&D. |
| 5 | Equipped with customized design work holders. |
Photomasks:Semiconductors, LCDs, OELDs, CFs, Thin Film Devices, IC Packaging, PWBs, PCBs, FPCs, etc., For use in cleaning plate-like substrates.
■Options
・Surfactant injection unit ・HEPA/ULPA unit ・ionizer ・hot air knife